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  CEMOP - Center of Excellence in Microelectronics Optoelectronics and Processes Last modified: 16 June 2003.
 
Publications
  1979-1984
  1985-1990
  1991-1994
  1995-2000
  2001-2003
Articles published between 1991 and 1994
 
26) E. Fortunato, G. Lavareda, M. Vieira and R. Martins.
"Thin Film Position Sensitive Detector Based on Amorphous Silicon p-i-n Diode".
Rev. Scientific Instruments, vol. 65(12), (1994), pp.3784-3786.
25) E. Fortunato, G. Lavareda, M. Vieira, R. Martins and L. Ferreira.
"Application of Thin Film Technology to Optical Sensors".
Vacuum, vol. 45 n.10/11, (1994), pp. 1151-1154.
24) M. Vieira, E. Fortunato, G. Lavareda, C.N. Carvalho and R. Martins.
"Light and Temperature Effect on PIN a-Si:H Device Performance".
Vacuum, vol. 45 n.10/11, (1994), pp. 1147-1149.
23) M. Vieira, E. Fortunato, C.N. Carvalho, G. Lavareda and R. Martins.
"Influence of the Photodegradation on the µt and Microstructure of PIN a-Si:H Devices".
Vacuum, vol. 45 n.10/11, (1994), pp. 1109-1111.
22) R. Martins and I. Ferreira.
"Engineering of the Energy Coupling in PECVD System used to produce large area a-Si:H coatings".
Vacuum, vol. 45 n.10/11, (1994), pp. 1107-1108.
21) E. Fortunato, M. Vieira, G. Lavareda, L. Ferreira and R. Martins.
"Material Properties, Project Design and Performances of Single and Dual-axis a-Si:H Large Area Position Sensitive Detectors".
J. of Non-Cryst. Solids, vols. 164-166, (1993), pp. 797-800.
20) R. Martins, A. Fantoni and M. Vieira.
"Tailoring Defects on Amorphous Silicon PIN Devices".
J. of Non-Cryst. Solids, vols. 164-166, (1993), pp.671-674.
19) R. Martins, I. Ferreira, N. Carvalho and L. Guimarães.
"Engineering of Plasma Deposition Systems Used for Producing Large Area a-Si:H Devices".
J. of Non-Cryst. Solids, Vols. 137&138, (1991), pp. 757-760.
18) M. Vieira, R. Martins, E. Fortunato, F. Soares and L. Guimarães.
"a-Si:H Ambipolar Diffusion Length and Effective Lifetime Measured by Flying Spot (FST) and Spectral Photovoltage (SPT) Techniques".
J. of Non-Cryst. Solids, Vols. 137&138, (1991), pp. 479-482.
17) G. Willeke and R. Martins.
"On the Structural, Optical, and Electronic Properties of Microcrystalline Si:O:C:H Thin Films Prepared in Two-Consecutive-Decomposition-Deposition-Chamber System".
Phil. Mag. B, Vol. 63, Nº 1, (1991), pp. 79-86.
16) S. Soalheira, R. Martins, C. Carvalho, I. Baía and L. Guimarães.
"Optoelectronic Properties Presented by Doped and Undoped Amorphous Silicon Films".
Portugal Physica, Vol. 20 (1991), pp. 31-37.
15) M. Vieira, R. Martins, E. Fortunato, M. Santos, A. Maçarico, N. Carvalho and L. Guimarães.
"Role of Carbon Incorporation on Structural and Transport Properties of a/mc-Si:C:H Films". Portugal Physica, Vol. 20, (1989/1991), pp. 21-29.
14) J.M.M. de Nijs, C. Carvalho, M. Santos and R. Martins.
"A Thin SiO Layer as a Remedy for the Indium Reduction at the In2O3/µc-Si:C:H Interface".
Applied Surface Science, Vol. 52, (1991), pp. 339-342.

 
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